The source of the ion beam with a cross section of 600×100 mm2 (40 кВ, 0,2 А)
1. Sources of gas ions with a cold cathode, capable of generating ion beams with a large cross-section area of tens to hundreds of square cm of any shape (circle, rectangle, tape). Ion energy 1-50 keV, beam current density 0.1-10 mA/cm2. Type of ions — any gas, including oxygen ions. Beam generation mode both continuous and pulse-periodic (0.01-1 ms, 1-1000 Hz). The package includes a plasma source of the electric power source.
Pilot batch of technological ion sources (80 cm2, 40 kV, 50 mA)
2. Ion implant for irradiation of samples and products with sizes up to 50 mm gas ion beams (ion energy 40 keV, fluence – up to 1019 cm-2) and metal ions (ion energy 30 keV, fluence – up to 5 1017 cm-2).
Ion implant for irradiation of samples and products with sizes up to 50 mm gas ion beams.
3. Installation for application of multi-element coatings by magnetron sputtering (up to 4 simultaneously sprayed targets, including dielectric), including reactive deposition of oxide and nitride coatings under controlled intensive ion tracking, realized by changing the current of a low-energy electron beam.
Installation for application of multi-element coatings by magnetron sputtering.