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The source of the ion beam with a cross section of 600×100 mm2 (40 кВ, 0,2 А)
1. Sources of gas ions with a cold cathode, capable of generating ion beams with a large cross-section area of tens to hundreds of square cm of any shape (circle, rectangle, tape). Ion energy 1-50 keV, beam current density 0.1-10 mA/cm2. Type of ions — any gas, including oxygen ions. Beam generation mode both continuous and pulse-periodic (0.01-1 ms, 1-1000 Hz). The package includes a plasma source of the electric power source.
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Pilot batch of technological ion sources (80 cm2, 40 kV, 50 mA)
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2. Ion implant for irradiation of samples and products with sizes up to 50 mm gas ion beams (ion energy 40 keV, fluence – up to 1019 cm-2) and metal ions (ion energy 30 keV, fluence – up to 5 1017 cm-2).
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Ion implant for irradiation of samples and products with sizes up to 50 mm gas ion beams.
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3. Installation for application of multi-element coatings by magnetron sputtering (up to 4 simultaneously sprayed targets, including dielectric), including reactive deposition of oxide and nitride coatings under controlled intensive ion tracking, realized by changing the current of a low-energy electron beam.
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Installation for application of multi-element coatings by magnetron sputtering.
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